Chemical vapor deposition (CVD) utilizes vapor-phase precursors to tunably and controllably deposit thin films on substrates or produce other nanomaterials such as nanowires, nanotubes, or nanocones. Often used in electronics and nanomaterial synthesis, such a technique involves the introduction of one or more vapor-phase precursors into a controlled pressure and high temperature environment, where the vapor is pyrolyzed into the desired solid material, which deposits, and gas/vapor phase byproducts, which are exhausted.
AACVD allows liquid, especially non-volatile liquid, precursors to be more easily/readily transported towards a reaction chamber, where they are evaporated in heated lines or hot carrier gas en-route and/or in the heated reaction chamber itself.
Sonaer nebulizers and particle generators, as well as high-temperature nozzles, can be utilized to produce micron-scale droplets of a wide variety of percursors such as organometallic compounds, aqueous solutions, organic solvents, etc. for AACVD systems. Sonaer offers custom, “turn-key” AACVD systems. Sonaer can also produce or assist in the production or development of AACVD systems using Sonaer devices.
Sonaer particle generator with quick disconnect fitting adapt easily to furnaces to make aerosols for depositing thin film on substrates. Devices are small in size and can be made into arrays for increased droplet output.
Sonaer has a line of high temperature atomizer nozzle for depositing thin films on substrates. Nozzle can operate with temperature up to 600 degrees C and can be ordered with high temperature spray shappers.
