Photoresist coatings are used for both electronic device and microelectromechanical (MEMs) device production. Photoresists are typically polymeric materials that are either enhanced (i.e. via cross-linking, negative photoresist materials) or solubilized (positive photoresist materials) via exposure to light, hence light is used to pattern photoresist coatings on substrates, a technique known as photolithography. Resist-coated substrates are then exposed to particular solvent(s) or solution(s), known as developers, to remove unwanted resist material, often in preparation for etching and/or the application of other functional material(s) to a substrate.
Sonaer nozzles can be utilized to clean substrates, as well as provide gentle, uniform coatings of resist material(s) to a controllable thickness. Sonaer nozzles can also be utilized to spray solvents or solutions used to remove unwanted resist material, etch substrates, and potentially even add other desired materials to these devices. Sonaer can produce or assist in developing “turn-key” automated robotic coating systems to move substrates through some or all of these steps, of benefit for design, prototyping, and/or scaling of production of MEMs or other electronic devices.
Sonaer has a complete line of spray shappers combined with our robotic coating equipment for spraying photoresistive materials. Ultrasonic atomizer nozzles proove to be an execellent choice for this type of spraying.
Sonaer atomizer nozzles are durable with chemical inertness and can handle many types of solutions. The company also has a SONOALLOY material for agressive solutions.
