Micro Etching Glass

Micron-scale feature etching in glass and other substrates is used in the microfluidics and microelectomechanical (MEMS) device fields. Spray nozzles can be utilized to clean substrates, deposit photoresist, and spray etching solutions or suspensions on substrates, which are three potential steps in this microfabrication process. Sonaer's Sonoalloy/TFE Fluoro nozzle is recommended for etchants such as hydrofluoric, phosphoric, hydrochloric, nitric, or sulfuric acids. Different nozzle tip materials can be used upon request or discovery of requirements for other common etchants such as buffered oxide etch (BOE), piranha, base piranha, RCA-1, RCA-2, or aqua regia. Fluoropolymer nozzles may be incorporated with special fluoropolymer air-assisted spray shapers to focus and direct etchant sprays.

Sonaer developed a unique atomizer nozzle made from fluoropolymer and SONOALLOY material for spraying aggressive solutions. These solutions are low ph acids, nitric acid, hydrochloric acid, hydrogen peroxide. Nozzle has no coatings inside or out to wear out. Atomizer nozzle is available with fluoropolymer spray shapers for focusing or wide coverage.